EBARA's Dry Vacuum Pumps and Gas Abatement Systems provides standard and customized solutions for the Photovoltaic Industry. With the experience, the proven technologies and the long track record for the most demanding applications of the Semiconductor Industry EBARA can handle the requirements for the silicon wafer and thin film Photovoltaic industry with the outstanding features regarding reliability, cost of ownership and operational stability of its products.

Dry Vacuum Pumps ESR, ESA and EST Series

Lowest energy and N2 consumption

Pumping speeds from 35 to 1766 CFM

Vacuums levels down to 10-3 mTorr

Special vacuum pumps with high hydrogen pumping speed

Excellence for particle handling of solar processes

Can be combined with additional Roots blowers to expand pumping capacity

Turbomolecular Pumps EMT and EBT Series

Both magnetically levitated and ceramic bearing types

Pumping speeds from 70 l/s to 3,300 l/s

Vacuum down to 10-9 mbar and outlet pressure up to 13 mbar

Special design for high throughput applications

Corrosive resistant models

Air or Water cooled

Burner Washer EBARA G5 and G6-PV

Point-of-use abatement system achieving highest abatement efficiency for waste gases including PFCs

Ideally suited for TCO and POCl3 applications

Pure Air Systems DynamicOxidation Systems S.DOC and E.DOC

Highly effective method to abate pyrophoric gases by using ambient air

Ideally suited for SiH4 abatement up to 20 slm

No cooling water, no fuel gas required

Airgard Water Scrubber CYCLONE

Point-of use abatement system

Total flow max. 1,000 slm

Automatic inlet plunger

Low maintenance requirements

Ideally suited for H2S/H2Se removal in CIS applications

This product portfolio fulfils the requirements in the various Solar applications, either as stand alone products or as a combination of products together with piping, frames, accessories etc. for turnkey solutions.

Stand alone Solutions

EBARA's Roots pumps (e.g. ESR80WN) ideally fit the needs for poly silicon production. EBARA's screw pumps EST100WN are meeting the harsh process requirements for SiN and diffusion processes. EBARA's G5 burner washer abatement system is the state-of-the-art technology, e.g. for POCl3 abatement in SiN processes.

OEM and Turnkey Solution

EBARA's A200WN, ESA500WN, ESR300WN and ESR500WN Roots pumps can be combined to big pumping stations to pump down the heavy gas load of equipment for TCO processes and for amorphous/microcrystalline tandem thin film layer formation. These pumps provide the highest customer benefit in terms of uptime, energy consumption and cost of consumables.

On the abatement side for TCO and tandem thin film layer formation, the burner washer type G5 abatement and the silane dynamic oxidizer S-DOC, combined with a particle filter are the most advanced solution ensuring maximum uptime and ease of waste removal.

A very specific solution of abatement technology is required for H2S/H2Se removal in CIS processes. The tool of choice to ensure the safe handling of toxic H2Se is an Airgard water scrubber, combined with a taylor-made waste water treatment system to neutralize the toxicity.

In addition to our highly competitive products and turnkey solutions, EBARA Precision Machinery Europe offers project planning, system engineering, installation, maintenance, consulting and training, incorporated in a worldwide support network at the major PV industry sites.