Model S.DOC

Dynamic Oxidation is the most cost effective abatement solutions for pyrophoric gas abatement. Pure Air Systems Inc. has been a pioneer in the development of pyrophoric gas abatement technologies since 1999. Large flows of pyrophoric gases like SiH4 are used extensively in Semiconductor and Thin Film Solar manufacturing processes. Dynamic oxidation provides one of the most reliable abatement methods at the lowest capital and operation cost. Managing the particles can be at integrated at point-of-use in the system or scaled up to a facility system. The dynamic oxidation units can be fitted with a mechanical filter (S.DOC), no filters (S.DOC Cyclone) or water scrubber (E.DOC-SC) to handle any water soluble gases.


  • Silane. Dynamic Oxidation Chamber
  • Process flows up to 100 slm
  • >99% Silane destruction
  • >99% solids collection
  • Low airflow interlock to shut off or bypass gas inlet(s)
  • Cabinet exhaust for secondary containment
  • No cooling water, No fuel gas
  • Smallest footprint
  • Silane
  • TEOS
  • Tungsten
  • Silane
  • Dichlorosilane
  • Ammonia
  • Phosphine
  • Specifications
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    Process Schematic
     
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