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Ebara can provide high-capacity particle traps with multi-liter capacities for applications with large particle loads, such as silicon wafer processing.
Multistage traps can be furnished for processes that require a combination of trap media, such as water-cooling and particle filtration. The trap shown here was developed for a GaAs MOC VD process. The first stage particle filter removes heavy metals, while the water cooled second stage collects sulfur.
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