High Capacity Water Cooled Traps
Semiconductor CVD equipment manufacturers require high wafer counts between preventative maintenance. Unlike other manufacturers who offer one solution to fit a number of applications, Ebara will design high-capacity water-cooled traps to achieve specific customer-stated goals. Port geometry, capacity, conductance and efficiency are adjusted in order to produce the optimal design for the application. Examples of processes we have provided solutions for include TiN barrier layer deposition, LPCVD Nitride and III -Vs MOC VD.