Ozone (O3) is a highly reactive gas composed of three oxygen atoms that can react to other substances or molecules thereby altering chemical composition. Within the semiconductor industry, Ozone is used to remove organic and metallic impurities on oxide films by acting as a strong oxidizer which can be generated naturally or manmade.
Semiconductor industry applications utilize this reactive gas in processes such as TEOS-O3 CVD, O3 photoresist ashing, sputtering, dry/wet cleaning, LP-CVD, ALD and ultrapure water generation. Where other uses extend into deep cleaning, various surface treatments, sterilization, bleaching, deodorization, disinfection and air purification. Industry benefits highlight its minimal environmental impact due to the ability to substitute sulfuric acid thus removing harmful chemical waste treatment requirements.
Team up with Ebara to understand the available ozone generating technologies while ensuring your equipment is rated for continuous use and that the proper safety mechanisms are in place.
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