As a vacuum supplier, we consider this a very exciting time in the semiconductor industries. As an innovator, EBARA’s has been a forerunner in providing world-class technology and award-winning global support since 1912. As newer and more complex manufacturing equipment and process requirements arise, we continue to innovate and leverage our experience to our customers globally.

EBARA is pleased to release its higher capacity dry vacuum pumps models for industries’ demanding applications with larger throughput requirements; Model EV-M1205SF, Model EV-M1685TSF and Model EV-M2085T. These higher flow models have expanded the EV-M Series’ handling capacity in   Each pump within the EV-M Series has been designed and manufactured with harsh processes and high-load applications specifically in mind. Achieving industry-leading performance by its multi-stage lobe design, superior corrosion cast material, high torque motor and intelligent control systems for enhanced energy savings.

The EV-M Series’ unique high-temperature technology support various by-product generating processes with inherent flexibility across a broad range of applications. Industry demanding applications include extreme ultraviolet (EUV) lithography, atomic layer deposition (ALD) and various chemical vapor deposition (CVD) processes such as low pressure (LPCVD), sub-atmospheric (SACVD), metal organic (MOCVD), plasma-enhanced (PECVD) and high-density plasma (HDPCVD).

Work with the Ebara Technologies’ Team to analyze and optimize your application requirements and best utilize EBARA’s higher flow dry vacuum pumps, auxiliary products and other services.

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