Dynamic Oxidation is the most cost effective solution for pyrophoric gas abatement. Large flows of pyrophoric gases like SiH4 are used extensively in Semiconductor and Thin Film Solar manufacturing processes. Dynamic oxidation provides one of the most reliable abatement methods at the lowest capital and operation cost. Managing the particles can be at integrated point-of-use in the system or scaled up to a facility system. The dynamic oxidation units can be fitted with a mechanical filter (DOU) or water scrubber (DOU-SC) to handle any water soluble gases.