The Model EV-M202N dry vacuum pumps are designed for high-load applications where large volumes of reaction byproducts are generated. Its outstanding power consumption performance and enhanced corrosion resistance, as a standard, support a broad range of industry applications.
Typical applications for EV-M dry pumps include high load applications such as Atomic Layer Deposition (ALD), a variety of etch and CVD processes and harsher TEOS processes that require the best vacuum performance and optimum uptime.
Pumping Speed (60 Hz): 20,000 l/min